瀏覽次數:605by:元佳宇
GeH4
Germane / Germaniun Hydride Application Germane gas is a source of hyper-pure germanium in the c
#CVD#GeH4#Germane#SiGe#germanium#silicon#四氫化鍺#鍺烷
Germane / Germaniun Hydride
Application
Germane gas is a source of hyper-pure germanium in the chemical vapor deposition and molecular beam epitaxy of amorphous germanium layers, silicon-germanium (SiGe) and borongermanium alloys. Germane is used for high performance complementary metal oxide semiconductors and SiGe technologies associated with heterojunction bipolar transistors for high speed digital communications such as broad band and cell phones. Other applications include photon detectors, solar cells, quantum dots and LEDS.
Product Specification
Purity: 99.999%
H2 30
N2 1
O2+Ar 0.2
CH4 0.5
CO2 0.5
CO 0.5
Ge2H6 20
Ge3H8 1
Cl-Ge 1
H2O 0.5
*Unit: ppm
Application
Germane gas is a source of hyper-pure germanium in the chemical vapor deposition and molecular beam epitaxy of amorphous germanium layers, silicon-germanium (SiGe) and borongermanium alloys. Germane is used for high performance complementary metal oxide semiconductors and SiGe technologies associated with heterojunction bipolar transistors for high speed digital communications such as broad band and cell phones. Other applications include photon detectors, solar cells, quantum dots and LEDS.
Product Specification
Purity: 99.999%
H2 30
N2 1
O2+Ar 0.2
CH4 0.5
CO2 0.5
CO 0.5
Ge2H6 20
Ge3H8 1
Cl-Ge 1
H2O 0.5
*Unit: ppm
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元佳宇
公司位置：高雄市-岡山區
統一編號：28877776
工業氣體、特殊氣體、電子氣體、特殊化學品、有機金屬、雷射切割氣體、氦氣、二氧化碳
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